Micro nano Fab Soft - Advancing the Standard

We provide flexible, high-performance software solutions for the optimization of micro and nano fabrication as well as metrology and inspection. As engineers, manufacturers, and tool suppliers we provide efficiency and optimal value in research, development, and production of future nano technologies.

BEAMER, introduced in 2006, has become the de-facto standard for e-beam direct write pattern processing. Most major nano-fabrication centers worldwide use BEAMER and TRACER to push the limits of their processes and applications. By combining powerful layout operation, comprehensive proximity & process correction, superior curving fracturing, field positioning and write sequence control, BEAMER enables a wide-range of demanding applications.

Our 3D lithography simulation software LAB, first introduced for proximity lithography, has become a key enabler for the flat panel display industry. LAB has been extended to cover projection (stepper), laser, and e-beam lithography, and is currently the most comprehensive FPD and simulation platform.

MASKER is a mask data preparation software package optimized for highest productivity and quality especially for masks in the application area of display, photonics, IoT and special devices. MASKER is extending the proven BEAMER technology by new Manhattan layout handling and advanced proximity/ process correction by a superior hierarchy engine and rule- and model-based MPC for laser and e-beam mask exposure.

For metrology and inspection, Micro nano Fab Soft first introduces ProSEM in 2017. It provides versatile and consistent offline analysis in particular for SEM images, with advanced contour detection and great ease-of-use. ProSEM helps getting more results from your images and improves the utilization of the SEM with automated image acquisition and metrology.

InSPEC is a new SEM metrology and inspection solution connecting to a SEM through digital and analog interfaces providing full control of beam shaping, stage-navigation, and image scanning. Advanced multi-tilt jobs become possible with the integrated workflow of scanning, correction, contour extraction, and data processing. InSPEC is the upgrade kit for your SEM to convert it into a versatile and sophisticated metrology tool for supporting nano-lithography of novel patterns and devices.